先進運算技術可確保高速和低功耗

先進的運算技術正在朝著實現高速和低功耗的方向取得巨大進步。該領域的關鍵進步包括新穎的矽架構，該架構使用分層設計以更低的成本構建更快、更小的晶片。

Advanced computing technologies are making great progress toward achieving high speed and low power consumption.

先進的運算技術正在朝著實現高速和低功耗的方向取得巨大進步。

Key advancements in this field include novel silicon architectures that use layered designs to build faster and smaller chips at a lower cost. Meanwhile, photonic computing utilizes light waves to process and store data. With the speed of light simply unsurpassable, this can offer high speed and low latency.

該領域的關鍵進步包括新穎的矽架構，該架構使用分層設計以更低的成本構建更快、更小的晶片。同時，光子運算利用光波來處理和儲存資料。由於光速無與倫比，因此可以提供高速和低延遲。

Then, there is biological computing, where information is encoded and stored in biological cells, propelled by progress made in nanobiotechnology. Quantum computing also offers significant potential, solving complex problems faster than today's computers by leveraging quantum superposition, entanglement, and interference.

然後是生物計算，在奈米生物技術進步的推動下，訊息被編碼並儲存在生物細胞中。量子運算還具有巨大的潛力，透過利用量子疊加、糾纏和乾涉，比現今的電腦更快解決複雜問題。

Moreover, neuromorphic computing mimics the neural systems of our brains to perform parallel computations; cloud computing moves processing to remote or virtual locations; and edge computing shifts processing from centralized facilities closer to end users.

此外，神經形態計算模仿我們大腦的神經系統來執行平行計算；雲端運算將處理轉移到遠端或虛擬位置；邊緣運算將處理從集中式設施轉移到更靠近最終用戶的地方。

All these developments in computing technology, which focus on tools and systems for processing, storing, and communicating data, have led to unprecedented advancements in fields including artificial intelligence (AI) and data analytics.

計算技術的所有這些發展都集中在處理、儲存和通訊數據的工具和系統上，導致人工智慧（AI）和數據分析等領域取得了前所未有的進展。

Ongoing research in the field has led to continued and rapid innovation in computing techniques, with scientists now going even deeper to achieve better, faster, and more efficient results.

該領域持續不斷的研究導致了計算技術的持續快速創新，科學家現在更加深入地研究以獲得更好、更快、更有效率的結果。

Breakthrough in Laser Nanoscale Fabrication in Silicon

矽雷射奈米級製造的突破

Researchers from Bilkent University, Turkey, recently achieved a significant breakthrough by developing a technique for fabricating nanostructures deep inside silicon wafers. 

土耳其比爾肯特大學的研究人員最近透過開發一種在矽晶片內部深處製造奈米結構的技術取得了重大突破。

The new method enables nanofabrication within silicon through spatial light modulation and laser pulses, creating advanced nanostructures that will benefit electronics and photonics.

新方法透過空間光調製和雷射脈衝實現矽內的奈米製造，創造出有利於電子和光子學的先進奈米結構。

The study focused on silicon, the foundation of electronics, photonics, and photovoltaics. As a semiconductor, Silicon's electrical conductivity lies between that of an insulator and a pure conductor. It is the second most abundant element in the Earth's crust, possessing both metallic and non-metallic properties. Additionally, Silicon's excellent electrical properties, including its relatively small energy gap, make it an important material in the semiconductor industry.

研究的重點是矽，它是電子、光子學和光伏發電的基礎。作為半導體，矽的電導率介於絕緣體和純導體之間。它是地殼中第二豐富的元素，具有金屬和非金屬特性。此外，矽具有優異的電氣性能，包括其相對較小的能隙，使其成為半導體產業的重要材料。

However, silicone has been limited to surface-level nanofabrication due to the difficulties posed by existing lithographic techniques. Current methods are either unable to penetrate the surface of the wafer without causing any changes or are restricted by the resolution of laser lithography. Additionally, existing techniques do not allow for high-precision modulation deep within the wafer. 

然而，由於現有光刻技術帶來的困難，矽樹脂僅限於表面級奈米加工。目前的方法要么無法穿透晶圓表面而不引起任何變化，要么受到雷射光刻分辨率的限制。此外，現有技術不允許在晶圓深處進行高精度調製。

If devices could be directly fabricated inside the bulk of this metal without altering the wafer's top or bottom surface, it would set a new standard.

如果可以在不改變晶圓頂部或底部表面的情況下直接在這種金屬內部製造裝置，那麼它將樹立一個新標準。

Of course, that means getting past all these challenges of a greater-than-1-micron fabrication resolution limit while simultaneously achieving multi-dimensional nanoscale control inside the wafer. Doing so, however, would be a magic advance, enabling 3D nanophotonics novel functionalities and leading to metasurfaces inside Si. 

當然，這意味著要克服大於 1 微米製造分辨率極限的所有挑戰，同時實現晶圓內部的多維奈米級控制。然而，這樣做將是一個神奇的進步，使 3D 奈米光子學具有新穎的功能，並在矽內部形成超表面。

The latest research went on to exploit spatially modulated laser beams and anisotropic feedback from preformed subsurface structures to achieve this. This allowed the team to establish controlled nanofabrication capability inside Si by manipulating matter at the nanoscale. 

最新的研究繼續利用空間調製雷射光束和預製地下結構的各向異性回饋來實現這一目標。這使得該團隊能夠透過在奈米尺度上操縱物質來在矽內部建立受控的奈米製造能力。

To elaborate, the Bilkent team addressed the challenge of complex optical effects within the wafer and the inherent diffraction limit of the laser light by utilizing the unique laser pulse, which was created by modulating the spatial. The spatially modulated laser pulses correspond to a Bessel function. 

具體來說，Bilkent 團隊利用調製空間產生的獨特雷射脈衝，解決了晶圓內複雜光學效應和雷射固有衍射極限的挑戰。空間調製雷射脈衝對應於貝塞爾函數。

The optical scattering effects, which had been obstructing the precise deposition of energy, were then overcome by the special laser beam's non-diffracting nature. This non-diffracting nature is created with advanced holographic projection techniques, which allows for the precise localization of energy. This leads to high enough pressure and temperature values to modify the material at a small volume. 

特殊雷射光束的非衍射特性克服了阻礙能量精確沉積的光學散射效應。這種非衍射性質是透過先進的全息投影技術創造的，可以實現能量的精確定位。這導致足夠高的壓力和溫度值以小體積改變材料。

According to Onur Tokel, Professor at the Department of Physics:

物理系教授 Onur Tokel 表示：

“Our approach is based on localizing the energy of the laser pulse within a semiconductor material to an extremely small volume, such that one can exploit emergent field enhancement effects analogous to those in plasmonics. This leads to sub-wavelength and multi-dimensional control directly inside the material.”

「我們的方法是基於將半導體材料內雷射脈衝的能量限制在極小的體積內，這樣人們就可以利用類似於等離激元學中的新興場增強效應。這導致了直接在材料內部的亞波長和多維控制。

He added:

他補充說：

“We can now fabricate nanophotonic elements buried in silicon, such as nanogratings with high diffraction efficiency and even spectral control.”

“我們現在可以製造埋在矽中的奈米光子元件，例如具有高衍射效率甚至光譜控制的奈米光柵。”

This was followed by an emergent seeding effect, where nano-voids performed on the subsurface created a strong field enhancement in their close surroundings. Once established, the resulting field enhancement sustains itself, which means that the creation of earlier nanostructures helps fabricate the later nanostructures. 

隨後出現了一種新興的播種效應，即地下的奈米空隙在其附近的周圍環境中產生了強烈的場增強。一旦建立，產生的場增強就會自我維持，這意味著早期奈米結構的創建有助於製造後來的奈米結構。

Meanwhile, the use of laser polarization provided researchers with additional control over nanostructures' alignment and symmetry at the nanoscale, which allows the accurate development of varied nano-arrays.

同時，雷射偏振的使用為研究人員提供了對奈米結構在奈米尺度上的排列和對稱性的額外控制，從而可以準確地開發各種奈米陣列。

“By leveraging the anisotropic feedback mechanism found in the laser-material interaction system, we achieved polarization-controlled nanolithography in silicon.”

“透過利用雷射-材料相互作用系統中發現的各向異性反饋機制，我們在矽中實現了偏振控制的奈米光刻。”

– The study lead author, Dr. Asgari Sabet 

– 研究的主要作者 Asgari Sabet 博士

This new fabrication method has achieved feature sizes as small as 100 nm, which is a great improvement over the conventional regimes. 

這種新的製造方法已經實現了小至 100 nm 的特徵尺寸，這比傳統方法有了很大的改進。

This study could have considerable

這項研究可能具有相當大的